Gallery
3rd Place, 2009
Pedro Barrios-Perez,
Wrinkled photoresist (200X)- Affiliation
- Institute for Microstructural Sciences
National Research Council of Canada - Location
- Otttawa, Ontario, Canada
- Technique
- Brightfield
Dr. Pedro Barrios-Perez used brightfield to capture the wrinkled photoresist magnified 200 times in his winning image. Dr. Barrios-Perez of the Institute for Microstructural Sciences at the National Research Council of Canada in Ottawa, won third place with a failed attempt to develop a photoresist pattern on a semiconductor.
“These pictures are taken out of my interest in art,” said Dr. Barrios-Perez. “If I show it to my boss, he just says, ‘Throw the sample away.’ I thought that it looked like a face with a fire that was warming up my days.” He added that the particular result “cannot be reproduced – some of this stuff just happens.”
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