Annual Winners

1991 Photomicrography Competition

3rd Place
1991 Photomicrography Competition

B.B. Fellman

Moog, Inc.
East Aurora, New York, USA

Subject Matter:

Diffusion welded 6A1-4V-Ti to 6A1-4V-Ti with thin copper layer as a bonding aid

(200x)
Technique:

Differential Interference Contrast


see: DIC