1991 Photomicrography Competition
3rd Place
1991 Photomicrography Competition
B.B. Fellman
Moog, Inc.
East Aurora,
New York, USA
- Subject Matter:
Diffusion welded 6A1-4V-Ti to 6A1-4V-Ti with thin copper layer as a bonding aid
(200x)- Technique:
Differential Interference Contrast
see: DIC