2007 Photomicrography Competition
![Small World](/images/SW50-logo.png)
![](https://www.nikonsmallworld.com/images/photos/2007/_photo800/IOD_Perez-9773-1.jpg)
Image of Distinction
Photoresist (PR) partially exposed to solvent
Dr. Pedro Barrios-Perez
- Affiliation
- National Research Council of Canada
Institute for Microstructural Sciences
Ottawa, Ontario, Canada
- Technique
- Brightfield
- Magnifaction
- 200